Products and Technology - uEtch Single Wafer R&D Systems

The uEtch is a single-wafer, dry HF vapor MEMS etch release tool specifically designed for the low-volume university and small research laboratory market. Additionally, processes developed on this lab system are easily transferable to standard Primaxx 3 and 25 wafer production systems providing a logical path from concept to pilot production to volume manufacturing. The uEtch is available in two versions; as a stand alone uEtch Module or a complete uEtch System.

Process Chamber and Gas PaneluEtch Chamber

The integrated, heated gas panel houses high purity ALD (Atomic Layer Deposition) valves to meter HF, vaporized alcohol and nitrogen into a heated, nickel plated aluminum process chamber. The process chamber incorporates the same “cross flow” reagent delivery and corrosion resistant materials used in Primaxx multi-wafer systems. The process chamber accomodates one substrate up to 200mm in diameter. Flow rates and process pressure can be adjusted by the user providing unparalleled versatility and flexibility in this ultra-compact design.

uEtch Module

uEtch ModuleThe uEtch Module includes an easy to use 5.7” touch screen controller for building, editing and running user configurable recipes. The chassis is made from ½” thick, durable HDPE plastic that provides thermal insulation for the heated components insuring stable temperature control. Measuring 14” (W) x 14” (D) x 18” (H), the uEtch Module takes up about the same space in an extracted fume hood as a “Home-Built” beaker and hot-plate system but provides superior etch performance and key safety benefits.

In addition to a host of hardware interlocks, the uEtch software continuously monitors the system to prevent unsafe operation of the tool.

uEtch System

uEtch System

If hood space is limited, the uEtch System occupies only 4 square feet of lab floor space. The uEtch System includes a custom exhausted enclosure housing one uEtch Module, an onboard anhydrous HF cylinder cabinet with a heated absolute pressure regulator, gas manifold and delivery line, and oversized alcohol vessel for extended run times and a power, process gas and vacuum facilities bulkhead.

This System configuration is aimed at simplifying installation and facilities requirements.