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The Monarch 3 Process Chamber is fabricated from aluminum and the assembly is nickel plated for HF compatibility. The design utilizes Primaxx's "cross-flow" technology to provide highly uniform etch performance. Up to 3 substrates are supported on ceramic alumina pins with a fourth position at the top available for a dummy wafer if required by the process. Adjustable wafer support brackets accommodate 100, 125, 150 and 200 mm substrates, and all internal hardware is easily removed for cleaning and maintenance. The chamber is heated (“useful” operating range is 35 - 70 °C) and has small volume with a high pumping speed to base pressure.
This compact “third generation” process module supports the 3-wafer process chamber. A compact Panel PC, touch screen, keyboard and pointing device are mounted on a swing arm assembly that includes an integrated light tower with user definable lamps/alarms (the swing arm can be located on either side of Process Module to suit installation limitations/ requirements). On-board electronics eliminate the need for a separate control tower, minimizing installation space requirements. Side panels are easily removed for lower unit access.
An integrated gas and liquid panel is accessed via a full size door on rear of unit. The HF gas stick with MFC bypass is mounted on a heated and enclosed panel. The alcohol vapor generation system comprises a reservoir, liquid MFC and custom heated vaporizer A nitrogen MFC provides controlled total process flow (with a preset portion directed through the vaporizer to entrain and transport alcohol vapor). HF and alcohol vapor lines are individually heated up to a coaxial mixing assembly with a single delivery line prior to the process chamber (also heated).
A variety of wafer loading options are available - from a manual single wafer open load unit to a semi-automatic 3-wafer loader with load lock (shown on right), to cluster-based configurations.
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