Products and Technology - CET25 Process Module

CET25 Process ChamberCET25 Process Chamber

The CET25 Process Chamber has been designed to etch 25 wafers simultaneously. Based on Primaxx's cross-flow design with inlet and outlet diffuser plates, the chamber is fabricated from nickel plated stainless steel for HF compatibility.

The chamber has two sections: a lower “load” section with gate valve interface, and an upper “process” section. Wafers are loaded individually into an internal "cassette" from a robot while “indexing” up into the process section. Each wafer is supported by 3 pins contacting the back side. Adjustable wafer support brackets accommodate 100, 125, 150 and 200 mm substrates.

Both upper and lower chamber sections are heated and controlled to +/- 1 °C.

CET25 Process Module

CET25 Process ModuleThis Process Module supports the 25 wafer capacity chamber described above. The lower section of the process module houses system electronics, and supports a stainless steel Gas Cabinet assembly. The exhausted Gas Cabinet is divided into two sections which house gas control and alcohol vapor generation system components. Small system footprint minimizes clean room space requirements

In the gas control section of the Gas Cabinet, there are three mass flow controlled gas lines for anhydrous HF, alcohol and nitrogen; the anhydrous HF and alcohol MFCs have bypasses installed for safe purging. Air operated valves control process flows and permit MFC isolation for service.

The liquid section of the cabinet contains an alcohol bubbler vessel (with constant temperature/ heating capability) and an alcohol reservoir. Bubbler liquid level is automatically monitored and adjusted at the start of each process run, ensuring both constant vapor delivery to the alcohol MFC, and good run to run repeatability.

CET25 Wafer Loading

The CET25 Process Module is available with the VPX and CPX (Brooks MX-400 and MX-600) wafer handling platforms.