Products and Technology - LSMCD Publications
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Mist Deposition in  Semiconductor Device Manufacturing, Semiconductor International, No 11, 2004

On the capacitance of metal/high-k dielectric material stack/silicon structures (Solid-State Electronics 46 (2002) 1991-1995)

Studies of Mist Deposited High-k Dielectrics for MOS Gates (INFOS 2001 paper)

Liquid Source Misted Chemical Deposition (LSMCD) of Thin Dielectric Films (ECS 2001 Paper)

Studies of High-k Dielectrics Deposited by Liquid Source Misted Chemical Deposition in MOS Gate Structures (ASMC 2001 Paper)

Development of Alternative to Spin-On Method of Thin Film Deposition Using Liquid Precursors

Studies of High-k Gate Dielectrics Deposited by the Liquid Source Misted Chemical Deposition (ECS 2000-13 Paper)

Mist deposited high-k dielectrics for next generation MOS gates (Solid-State Electronics 46 (2002) 1671-1677)

Effect of Thermal Anneal on Mist Deposited HfSiO4/SiOx/Si Structures (ECS 2003 Paper)