Products and Technology - Liquid Source Misted Chemical Deposition (LSMCD)

Liquid Source Misted Chemical Deposition (LSMCD) is a patented process for depositing high quality metal oxide, polymer, and other films directly from liquid sources. This unique technology applies thin, conformal layers of liquid precursor onto substrates (often with submicron surface features) to form high quality films of ferroelectric, dielectric, opto-electronic and polymer materials.

Major features and benefits of Primaxx LSMCD tecnology include:

  • Excellent results with MOD precursors
  • High conformality and across-the-wafer uniformity
  • Superior electrical properties for ferroelectric and high-k films of > 5 nm thickness
  • Precise stoichiometric control
  • Excellent wafer-to-wafer repeatability
  • Precise curing temperature control for optimal perovskite crystal structure with optional RTA
  • Low defect density for increased yields
  • Small MESC cluster footprint saves cleanroom space
  • Wide range of applications with liquid based materials
  • Deposition over platinum or other electrode materials


In addition, LSMCD technology can be used to deposit thin films onto substrates that are totally incompatible with spin-on deposition including very large, flexible and heavy substrates. This technique can also be adapted for roll-to-roll and web coating applications.

Leaders in Complex Oxide Thin Film Technology

With the introduction of this unique, patented Liquid Source Misted Chemical Deposition system, Primaxx has demonstrated the ability to deposit complex metal oxide films directly from liquid sources. LSMCD offers many benefits over competing processes such as spin-on and sputtering since it provides good thickness and stoichiometry conformality over shallow surface features. LSMCD is particularly successful in depositing various MOD solutions for films of 5 nm and above.

Because LSMCD yields excellent film conformality as well as eliminating voids around surface structures typically associated conventional spin-on technology, process yields can increase dramatically as illustrated on the LSMCD Performance and Applications page.

LSMCD Technology Overview

LSMCD System Configurations and Specifications

LSMCD Performance and Applications

LSMCD Product Literature

LSMCD Technical Publications